Third Microsymposium of the "International Scholarship Program for Graduate Studies in Faculty of Chemistry, University of Warsaw - From simple molecules to nanostructured and bioactive materials" October 6 - 8th, 2011, Palace in Łochów, Poland
Chronicle
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Thursday Oct. 6th 15:00 - 15:30 – Agata Krywko - Cendrowska Electrochemical deposition of Si and SiOx from 0.05M TBAB/PC on platinum and gold electrodes The purpose of this part of the research was to study the process of electrochemical deposition of silicon based films on gold and platinum surfaces and to optimize deposition conditions in order to obtain a film with fine purity, proper thickness and electronic properties. The deposition was performed by potentiostatic method from 0.01 to 0.2M trichlorosilane dissolved in 0.05M solution of tertbuthylammonium bromide (TBAB) in propylene carbonate (PC). The morphology of obtained films was controlled by using optical microscopy and Atomic Force Microscopy (AFM). Chemical characterization was performed by spectroscopic (Infrared Spectroscopy, Raman Spectroscopy) and electrochemical methods (i. e. Cyclic Voltammetry). Si based layers were obtained in long time deposition at low potentials (-2.85 to –2.25V vs Ag-wire). Spectroscopic characterization shows that films are made of silicon, silicon oxides and hydrogen terminated silicon. The photoactivity of such deposits shows both n- and p-type behaviour. 
Discussion 
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